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Cleaning before photolithography

Organic contaminants can prevent proper adhesion of the photoresist layer, leading to defects in the patterning process. TOC monitoring helps verify that cleaning agents and rinse water are free from organic impurities.

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Cleaning after etching or implantation

Residual organic materials and other contaminants can interfere with subsequent processing steps and degrade device performance. Monitoring TOC ensures these contaminants are effectively removed to prevent defects.

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Chemical Mechanical Planarization

This polishing step uses a slurry of chemicals and abrasives to smooth wafer surfaces. Organic contaminants in the slurry can cause surface scratches or leave residues. TOC analysis confirms the cleanliness of slurry and chemicals to maintain wafer quality.

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